Course Outline
- Module I – Historical overview – Why and how CMP came about – A look into the future
- Module II – Definitions of terms
- Module III – Review of selected experimental evidence with the goal to introduce and discuss observations that form the basis for a conceptual understanding of CMP phenomena and CMP models
- Module IV – Bulk polishing theory with the goal to apply a proper model for oxide and metal polish
- Module V – Pads
- Module VI – Tribology of CMP and nano-particle settling in slurries
- Module VII – Advanced topics in CMP
- Module VIII – Reactor design and modeling
- Module IX – Diamond and CVD discs for pad conditioning
- Module X – Retaining rings