ESPRO’s CFTHPS Three-Hole Capsule Filter is engineered for high-efficiency filtration of small to medium flow rates in semiconductor lithography applications.

Designed for point-of-use (POU) processes, the CFTHPS series features a non-prewetted PTFE membrane, ensuring optimized membrane efficiency and maintaining maximum flow rates, particularly in photoresist filtration.

The compact and stable design of the CFTHPS capsule allows for seamless installation in cleanroom environments. With its tool-free, quick-change feature, filter replacements can be completed in just minutes, minimizing drips and the potential for contamination during maintenance.

The CFTHPS series offers eight different removal rate media options to provide flexibility in meeting the specific needs of various filtration processes. The available media includes PTFE, PP, UPE, or N66 membranes, supported by an HDPE shell and sealed with FFKM, ensuring both chemical compatibility and durability.

This capsule filter is available in two sizes—2.5" and 5" lengths, with a 62mm diameter—to suit a variety of flow rate requirements. The CFTHPS capsule operates under a maximum differential pressure of 0.39 MPa at 25°C, with a maximum operating pressure of 0.27 MPa at 25°C. Designed to withstand working temperatures up to 40°C, this filter ensures reliability and longevity in demanding lithography applications.

Ideal for semiconductor photoresist filtration processes, the CFTHPS series provides a reliable and efficient solution for ensuring cleanliness and flow stability at the point of use, with adaptable removal rates to suit a wide range of applications.