esPRO’s CFTHP Three-Hole Capsule Filter is specifically designed for efficient filtration of small to medium flow rates in semiconductor lithography applications at the point of use (POU). Featuring an advanced multi-material membranes, these filters are not pre-wetted, optimizing membrane efficiency and ensuring maximum flow rates in photoresist POU filtration processes within the semiconductor industry.

The CFTHP series offers a compact, stable design that allows for easy installation and filter replacement. Filters can be changed in just a few minutes without the need for tools or draining, minimizing drips and ensuring a clean, efficient process.

This capsule filter features a three-port design with inlet, outlet, and vent connections, offering flexible system integration. With a 70mm diameter and available in both 2.5" and 5" lengths, it supports a variety of filtration needs with eight different removal ratings to ensure optimal performance.

Constructed with PTFE/PP/UPE/N66 filter media and HDPE support, the CFTHP capsule filter provides reliable filtration in demanding lithography environments. The capsule is sealed with FFKM and built with an HDPE shell for robust chemical compatibility. It operates at a maximum working temperature of 40ºC with a maximum differential pressure of 0.39 MPa (25ºC) and maximum operating pressure of 0.27 MPa (25ºC).

The CFTHP Photolithography Capsule Filter is engineered for ease of use, reliable filtration, and efficient maintenance, making it an ideal solution for critical semiconductor lithography applications.