ESPRO’s CFTHES Three-Hole Capsule Filter is specifically designed for efficient filtration of small to medium flow rates in semiconductor lithography applications, ensuring optimal filtration at the point of use (POU). The CFTHES series features PTFE membranes that are not prewetted, maximizing membrane efficiency and maintaining maximum flow rates in photoresist filtration processes.

With its compact and stable design, the CFTHES capsule filter allows for quick and easy installation, with no tools required for filter changes. This design reduces downtime, minimizes drips, and ensures cleanliness during filter replacements, making it an ideal solution for semiconductor applications.

The CFTHES series offers four different filter media options—PTFE, PP, UPE, and N66, supported by a durable HDPE capsule, and sealed with FFKM for enhanced chemical compatibility and durability. This filter is available in 2.5" and 5" lengths, with a 65mm x 49mm rectangular top to meet various system design requirements.

With eight different removal rates available, the CFTHES capsule filter can be tailored to suit a wide range of filtration needs. Operating under a maximum differential pressure of 0.39 MPa at 25°C and a maximum operating pressure of 0.27 MPa at 25°C, the CFTHES filter provides reliable performance in demanding lithography applications, withstanding temperatures up to 40°C.

Designed for point-of-use photoresist filtration, the CFTHES Three-Hole Capsule Filter offers exceptional ease of use, high-efficiency filtration, and adaptability, making it a dependable solution for semiconductor lithography processes.