ESPRO’s CFTHEL Three-Hole Capsule Filter is specifically designed for efficient filtration of small to medium flow rates in semiconductor lithography applications at the point of use (POU). The CFTHEL series features non-prewetted PTFE membranes, optimizing membrane efficiency and ensuring maximum flow rates in demanding photoresist filtration processes within the semiconductor industry.

This capsule filter is constructed with a compact and stable design, allowing for easy installation and quick filter changes without the need for tools or draining. The filter’s innovative design minimizes drips, ensuring a clean and efficient changeout process, which is critical for maintaining system cleanliness and reliability.

The CFTHEL series features inlet, outlet, and vent ports, making it versatile for a variety of system configurations. The capsule is constructed with high-quality polypropylene (PP), with a sealing system made from FFKM to ensure durability and chemical compatibility. The filter media is available in PTFE, PP, UPE, and N66, providing multiple options for filtration needs.

Available in 2.5" and 5" lengths and a diameter of 87mm, the CFTHEL capsule filters offer eight different removal ratings, making them adaptable for a wide range of filtration applications. With a maximum differential pressure of 0.39 MPa at 25°C and a maximum operating pressure of 0.27 MPa at 25°C, the filters perform reliably under temperatures up to 40°C.

All ESPRO filters, including the CFTHEL series, are manufactured in a cleanroom under an ISO9001-certified facility, ensuring the highest standards of cleanliness and quality for ultrapure filtration solutions in critical semiconductor processes.