CMP Process Training - Module 8:
Reactor design and modeling
- The pad-slurry-wafer interface as a chemical engineering reactor
- The residence time distribution (RTD) technique
- Definitions, derivations and applications of slurry mean residence time, dispersion number, turnover ratio and slurry utilization efficiency
- Case studies re: the effects of flow rate, groove geometry, polish time, pressure and sliding velocity on the above (and key polishing outcomes)