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CMP Process Training - Module 10

CMP Process Training - Module 10

Product description

CMP Process Training - Module 10:
Retaining rings

  • Materials of construction and main functions
  • How do retaining rings work and how certain designs may affect polishing outcomes
  • Bow waves and hydrodynamic boundary layers
  • The Stribeck+ curve applied to retaining rings
  • Tribological, thermal and kinetic attributes of PEEK and PPS AMAT Reflexion rings for ILD and Cu applications
  • Tribological, thermal and kinetic attributes of PEEK and PPS AMAT Reflexion rings for ILD and W applications
    • Effect on pad cut rate (PCR) and ring wear rate (RWR)
    • SEM of pad debris AND ring debris generated due to disc wear AND ring wear
    • Effect of retaining rings on pad micro-texture

 

ESPRO

CMP Process Training - Module 10

Part of a 10 module course
A great, detailed overview of CMP equipment, materials, and processes
16 hours in total
Either a 2 full-day training (face-to-face) or 8 2-hour blocks once a week (remote training, 8 weeks total)

Specifications

Brand
ESPRO
Product Number
CMP-Training-Mod010
Status
Request information