CMP-Training - Module 1:
Historical overview – Why and how CMP came about – A look into the future
- IC fabrication and the need for CMP
- Early device isolation issues and the invention of STI
- Brief look at CMP equipment, consumables and the dimensions of things involved
- The 2017 IRDS and some of the challenges looking forward
- Selected CMP nanoparticle synthesis pathways
- Frank William Preston and his equation
- Some basic CMOS device cross-sections