esPRO’s CMP-PP Pleated Filter Cartridges utilize advanced patented spin nano fiber technology, offering a groundbreaking filtration performance that surpasses traditional blown melt media used in CMP slurry applications. The nano fiber media's fine structure enables highly efficient contaminant capture without the risk of media flow restrictions, ensuring uninterrupted and consistent slurry filtration.

Designed with multi-layer PP (polypropylene) membranes, these pleated filters provide superior contaminant-holding capacity while maintaining a high flow rate. The unique pleated design maximizes the filter's surface area, significantly extending service life and reducing maintenance requirements, making them an ideal solution for CMP polishing.

The CMP-PP series filters are constructed entirely from PP, including the support, end caps, cage, and core, to ensure chemical compatibility and structural integrity under rigorous operating conditions. With a maximum working temperature of 80°C (176°F), these filters perform reliably in a wide range of chemical and slurry polishing processes.